Bayerischer
Forschungsverbund für Nanoelektronik (FORNEL)
2nd
FORNEL Workshop on
Nanoelectronics
Würzburg,
March 15, 2006
Workshop Flyer
Presentations
Presentation of FORNEL
H. Ryssel, University of Erlangen-Nuremberg
Vertical Field Effect Transistors
L. Höllt, Bundeswehr University, Munich
X-ray Detectors
J. Kemmer, KETEK, Munich
Y Transistors
L. Worschech, University of Würzburg
Nanotechnology: Challenges for Future MOSFET Generations
J. Lindolf, Infineon Technologies, Munich
Roadmap of Organic Devices: From OLEDs to Charge Transport through
Single Molecules
W. Riess and H. Riel, IBM Zurich
Molecular Devices, Circuits, and Architectures
P. Lugli, F. Brunetti, G. Csaba, C. Erlen, and G. Scarpa, TU Munich
Nanowire Technology and Characterization
P. Pauzauskie, University of Berkeley
Atomic Layer Deposition of Silicon
Nitride
B. Fabel, TU Munich
Hafnium Silicate Layers as
High-k Gate Dielectrics for Future CMOS
Generations
M. Lemberger, University of Erlangen-Nuremberg
Silicate Formation in High-k Dielectric Layers
D. Schmeißer, University of Cottbus
Achieving Ultra Low-k Dielectric Constants for Nanoelectronic
Interconnect Systems
T. Gessner and S. E. Schulz, Fraunhofer IZM, Chemnitz
State of the Art: Nanoimprint Lithography by Suss MicroTec
S. Hansen, Suss MicroTec, Garching
UV Polymers for Nanoimprint
Lithography
H. Schmitt, University of Erlangen-Nuremberg, and C. Lehrer, Fraunhofer
IISB, Erlangen
Mesoscopic Fluctuations of
Nonlinear Conductance
M. Polianski, University of Geneva
Perspectives and Challenges in Nanoscale Device Modeling
G. Iannacone, University of Pisa
[Home]
[Impressum]